pair_style coul/shield command
pair_style coul/shield cutoff tap_flag
cutoff = global cutoff (distance units) tap_flag = 0/1 to turn off/on the taper function
pair_style coul/shield 16.0 1 pair_coeff 1 2 0.70
Style coul/shield computes a Coulomb interaction for boron and nitrogen atoms located in different layers of hexagonal boron nitride. This potential is designed be used in combination with the pair style ilp/graphene/hbn
This potential is intended for electrostatic interactions between two different layers of hexagonal boron nitride. Therefore, to avoid interaction within the same layers, each layer should have a separate molecule id and is recommended to use the “full” atom style, so that charge and molecule ID information is included.
Where Tap(r_ij) is the taper function which provides a continuous cutoff (up to third derivative) for inter-atomic separations larger than r_c (Leven1), (Leven2) and (Maaravi). Here lambda is the shielding parameter that eliminates the short-range singularity of the classical mono-polar electrostatic interaction expression (Maaravi).
The shielding parameter lambda (1/distance units) must be defined for each pair of atom types via the pair_coeff command as in the example above, or in the data file or restart files read by the read_data or read_restart commands:
The global cutoff (r_c) specified in the pair_style command is used.
Mixing, shift, table, tail correction, restart, rRESPA info:
This pair style does not support parameter mixing. Coefficients must be given explicitly for each type of particle pairs.
The pair_modify table option is not relevant for this pair style.
This pair style does not support the pair_modify tail option for adding long-range tail corrections to energy and pressure.
This pair style can only be used via the pair keyword of the run_style respa command. It does not support the inner, middle, outer keywords.
This style is part of the USER-MISC package. It is only enabled if LAMMPS was built with that package. See the Build package doc page for more info.