Amorphous intergranular films act as ultra-efficient point defect sinks during collision cascades
JE Ludy and TJ Rupert, SCRIPTA MATERIALIA, 110, 37-40 (2016).
Atomistic simulations are used to explore the effect of interfacial structure on residual radiation damage. Specifically, an ordered grain boundary is compared to a disordered amorphous intergranular film, to investigate how interface thickness and free volume impacts point defect recombination. Collision cascades are simulated and residual point defect populations are analyzed as a function of boundary type and primary knock on atom energy. While ordered grain boundaries easily absorb interstitials, these interfaces are inefficient vacancy sinks. Alternatively, amorphous intergranular films act as ultra-efficient, unbiased defect sinks, providing a path for the creation of radiation- tolerant materials. (C) 2015 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
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